article · 01/01/2004
Fabrication of three-dimensional microstructures using standard ultraviolet and electron-beam lithography
Résumé
We have designed and fabricated shape-controlled three-dimensional structures combining electron-beam and ultraviolet (UV) lithography. Starting with a tiff file format, a gray scale pattern using a high energy beam sensitive mask is produced with electron-beam direct writing. In only a one step UV exposure, an optical lens and a photonic band gap structure in 16.5 mum thick AZ 4562 positive photoresist, with controlled profile and smooth resist surface, were fabricated. A three-dimensional grid structure was also transferred to a 100 mum thick SU-8 negative photoresist. (C) 2004 American Vacuum Society.
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Galas, J., Belier, B., Aassime, A., Palomo, J., Bouville, D., & Aubert, J. (2004). Fabrication of three-dimensional microstructures using standard ultraviolet and electron-beam lithography. J. Vac. Sci. Technol. B, 22(3). https://doi.org/10.1116/1.1755213@article{Galas2004_124,
author = {Galas, JC and Belier, B and Aassime, A and Palomo, J and Bouville, D and Aubert, J},
year = {2004},
month = {1},
title = {Fabrication of three-dimensional microstructures using standard ultraviolet and electron-beam lithography},
journal = {J. Vac. Sci. Technol. B},
publisher = {A V S AMER INST PHYSICS},
volume = {22},
number = {3},
address = {STE 1 NO 1, 2 HUNTINGTON QUADRANGLE, MELVILLE, NY 11747-4502 USA},
abstract = {We have designed and fabricated shape-controlled three-dimensional structures combining electron-beam and ultraviolet (UV) lithography. Starting with a tiff file format, a gray scale pattern using a high energy beam sensitive mask is produced with electron-beam direct writing. In only a one step UV exposure, an optical lens and a photonic band gap structure in 16.5 mum thick AZ 4562 positive photoresist, with controlled profile and smooth resist surface, were fabricated. A three-dimensional grid structure was also transferred to a 100 mum thick SU-8 negative photoresist. (C) 2004 American Vacuum Society.},
url = {http://www.dx.doi.org/10.1116/1.1755213},
doi = {10.1116/1.1755213},
issn = {1071-1023},
}TY - JOUR
AU - Galas, JC
AU - Belier, B
AU - Aassime, A
AU - Palomo, J
AU - Bouville, D
AU - Aubert, J
PY - 2004
DA - 2004/01/01
TI - Fabrication of three-dimensional microstructures using standard ultraviolet and electron-beam lithography
JO - J. Vac. Sci. Technol. B
VL - 22
IS - 3
PB - A V S AMER INST PHYSICS
SN - 1071-1023
AB - We have designed and fabricated shape-controlled three-dimensional structures combining electron-beam and ultraviolet (UV) lithography. Starting with a tiff file format, a gray scale pattern using a high energy beam sensitive mask is produced with electron-beam direct writing. In only a one step UV exposure, an optical lens and a photonic band gap structure in 16.5 mum thick AZ 4562 positive photoresist, with controlled profile and smooth resist surface, were fabricated. A three-dimensional grid structure was also transferred to a 100 mum thick SU-8 negative photoresist. (C) 2004 American Vacuum Society.
DO - 10.1116/1.1755213
UR - http://www.dx.doi.org/10.1116/1.1755213
ER -