article · 01/01/2006
Focused ion beam sculpted membranes for nanoscience tooling
Résumé
High resolution FIB offers nowadays the capability to sculpt matter at the nanometer scale. Using FIB to engrave membranes opens new emerging routes for nanoscience tooling. We propose here a way to fabricate tensile SiC membranes (with thicknesses adjustable between 10 and 100 nm), in order to drill them with high resolution focused ion beam, to obtain holes below 15 nm. Moreover, we show how we can, in some specific conditions, take advantage of the behavior of the irradiated matter (sputtering/redeposition processes) to reduce the size of the drilled hole below 10 nm. Eventually, we present two applications of these objects in biophysics and nanoscience tooling. (c) 2006 Published by Elsevier B.V.
Citer cet article
Biance, A., Gierak, J., Bourhis, E., Madouri, A., Lafosse, X., Patriarche, G., Oukhaled, G., Ulysse, C., Galas, J., Chen, Y., & Auvray, L. (2006). Focused ion beam sculpted membranes for nanoscience tooling. Microelectron. Eng., 83(4-9). https://doi.org/10.1016/j.mee.2006.01.133@article{Biance2006_121,
author = {Biance, AL and Gierak, J and Bourhis, E and Madouri, A and Lafosse, X and Patriarche, G and Oukhaled, G and Ulysse, C and Galas, JC and Chen, Y and Auvray, L},
year = {2006},
month = {1},
title = {Focused ion beam sculpted membranes for nanoscience tooling},
journal = {Microelectron. Eng.},
publisher = {ELSEVIER SCIENCE BV},
volume = {83},
number = {4-9},
address = {PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS},
abstract = {High resolution FIB offers nowadays the capability to sculpt matter at the nanometer scale. Using FIB to engrave membranes opens new emerging routes for nanoscience tooling. We propose here a way to fabricate tensile SiC membranes (with thicknesses adjustable between 10 and 100 nm), in order to drill them with high resolution focused ion beam, to obtain holes below 15 nm. Moreover, we show how we can, in some specific conditions, take advantage of the behavior of the irradiated matter (sputtering/redeposition processes) to reduce the size of the drilled hole below 10 nm. Eventually, we present two applications of these objects in biophysics and nanoscience tooling. (c) 2006 Published by Elsevier B.V.},
note = {31st International Conference on Micro- and Nano-Engineering, Vienna, AUSTRIA, SEP 19-22, 2005},
url = {http://www.dx.doi.org/10.1016/j.mee.2006.01.133},
doi = {10.1016/j.mee.2006.01.133},
issn = {0167-9317},
}TY - JOUR
AU - Biance, AL
AU - Gierak, J
AU - Bourhis, E
AU - Madouri, A
AU - Lafosse, X
AU - Patriarche, G
AU - Oukhaled, G
AU - Ulysse, C
AU - Galas, JC
AU - Chen, Y
AU - Auvray, L
PY - 2006
DA - 2006/01/01
TI - Focused ion beam sculpted membranes for nanoscience tooling
JO - Microelectron. Eng.
VL - 83
IS - 4-9
PB - ELSEVIER SCIENCE BV
SN - 0167-9317
AB - High resolution FIB offers nowadays the capability to sculpt matter at the nanometer scale. Using FIB to engrave membranes opens new emerging routes for nanoscience tooling. We propose here a way to fabricate tensile SiC membranes (with thicknesses adjustable between 10 and 100 nm), in order to drill them with high resolution focused ion beam, to obtain holes below 15 nm. Moreover, we show how we can, in some specific conditions, take advantage of the behavior of the irradiated matter (sputtering/redeposition processes) to reduce the size of the drilled hole below 10 nm. Eventually, we present two applications of these objects in biophysics and nanoscience tooling. (c) 2006 Published by Elsevier B.V.
DO - 10.1016/j.mee.2006.01.133
UR - http://www.dx.doi.org/10.1016/j.mee.2006.01.133
ER -